The EMS R T is a large chamber, rotary-pumped coating system ideally suited for sputtering a single large diameter specimen up to 8″/ mm (e.g. a wafer). The EMST S Plus is a high resolution sputter coater for oxidizing and non- oxidizing The EMS T Plus product line is a compact turbomolecular- pumped. EMS T Turbo-Pumped Sputter Coater/Carbon Coater. The EMST is a compact turbomolecular- pumped coating system suitable for SEM,. TEM and many.
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Overview Platforms Workstations Isolation Platforms. Sputtering head insert suitable for oxidizing and non-oxidizing metals.
A large multi-color ens indicator light provides a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance. Full graphical interface with touch screen buttons. Rotating specimen stage for glass microscope slides dputter to two x 75 mm x 25 mm slides.
Pulsed and ramped carbon rod recipes are supplied as standard. Coating inserts are interchangeable. A rotary planetary style stage with a variable tilt angle from horizontal to 30 degrees. System prompts user to confirm target material and it then automatically selects appropriate parameters for that material.
The target to stage height is variable between 0 mm and 42 mm for the standard stage.
A large multi-color status indicator light sputtter a visual indication of the state of the equipment, allowing users to easily identify the status of a progress at a distance. The maximum sputtering time is 60 minutes without ‘breaking’ vacuum and with built-in rest periods. As sputtered or evaporated material is deposited onto the crystal, so its frequency of oscillation is modified. QT S Sputter Coater.
Tilt and height can be pre-set. The maximum sputtering time is 60 minutes without breaking vacuum and with automatically built-in cooling periods.
A robust, ripple free DC power supply featuring pulse evaporation ensures reproducible carbon evaporation from cord sources. This allows the user to configure the system as a sputter coater, evaporator or glow discharge system — all in turbi space saving format. To ensure even deposition, the EMS T T Plus coaters are fitted with a rotating specimen stage and three individual magnetron target assemblies, which enhance sputter efficiency of the process by using tubo voltages.
The deposition heads can be swapped in seconds and the intelligent system logic automatically recognizes which head is in place and displays the appropriate operating settings. Coating inserts are interchangeable. Fitted with a carbon rod evaporation head for 3.
Including oscillator, feed-through, quartz crystal holder and one quartz crystal.
Home Online Catalog of Microscopy Products. Hydraulically-formed bellows stainless-steel backing line. Users can rapidly change the chamber, if necessary, to avoid cross contamination of sensitive samples. When used with the extended height cylinder optional accessory the target to stage height would be an additional 87 mm. This ‘modification’ is used to measure and control the thickness of material deposited.
A lockable emergency stop e-stop switch which can be mounted on top of the system in a position easily accessible for the operator. Aluminum Al rapidly forms an oxide layer which can be difficult to remove.
The thickness spuyter on the monitor can be correlated to the thickness on the substrate using a mathematical formula built into the software; this allows the user to control the thickness of material deposited on to the eme.
A lockable emergency stop e-stop switch which can be mounted on top of the system in a position easily accessible for the operator.
Full range vacuum gauge for low and high vacuum measurement a low vacuum Pirani gauge is fitted as standard. All are slutter, drop-in style no screws and the rotation speed is variable between pre-set limits. Home Online Catalog of Microscopy Products. Uses 57 mm diameter disc targets – still available from Quorum. Sputter coating is a technique widely used in various applications; it is possible to create a fms and sputter metals with high voltage, poor vacuum and no automation.
This “modification” is used to measure and control the thickness of material deposited. The case houses all the working components, including automatic bleed control that ensures optimum vacuum conditions during sputtering.
By ticking this box you are confirming that Quorum Technologies and it’s distributors can contact you regarding our products and spytter. The EMS T ES has a spytter range of optional accessories, including specimen stages and film thickness measurement which means the system can be tailored to the precise requirements of the user. High vacuum turbo pumping allows sputtering of a wide range of oxidizing and non-oxidizing metals for thin film and electron microscopy applications.
Dual channel film thickness monitor FTM.
Sputter & Carbon Coaters and Evaporators
Carbon rod evaporation insert for 3. Stage rotation speed variable between preset limits. For increased source to specimen distance and for coating large specimens. Designed for sputtering non-oxidising metals – gold Au fitted as standard.